EECS 143 - Prof. Nathan W. Cheung,
Prof. Tsu-Jae King, Prof. Andrew R. Neureuther
EECS143 teaches the senior EECS student the fundamentals of integrated circuit processing. Upon completion of this course, the student will have an understanding of basic IC processing, and the dependence of MOS and Bipolar transistors on processing choices. After an overview of the crucial processing steps of several major silicon technologies such as CMOS, Bipolar and BiCMOS, we will give a detailed description of the such process steps as lithography, etching, oxidation, diffusion, implantation, thin film deposition, metallization, etc. We will then focus on the dependence of Bipolar and CMOS device behavior on process parameters. Significant emphasis is placed on the use of process simulation and other technology CAD tools, as well on the actual processing and characterization of silicon wafers in the lab.
Square Footage: 850
Last modified by webmaster - Oct. 25, 2005